Nanolaboratory

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Molecular-Beam Epitaxy Systems (MBE) Wafer Processing Equipment (PVD, PE, PECVD, RTA) Components and accessories Integrated solutions Nanolaboratory	Nanolaboratory Fully equipped compact Nanolaboratory is intended for creating the wide range of semiconductor devices. Description Design features Advantages Complete set of Nanolab’s technological equipment includes: Compact MBE system STE75 in two configurations: for А³В⁵/А²В⁶ and A³N compounds; Electron-beam evaporation system STE EB71; Magnetron sputtering system; Plasma etching and plasma enhanced chemical vapour deposition system (PE & PECVD) with inductive and capacitive matched plasma sources; RTA (rapid thermal annealing) and RTP (rapid thermal processing) Systems; Complex of required analytical tools, equipment for chemical pro-cessesand photolithography; Basic techology processes documentation; Extensive modern training program, including video-training, 3D-visualization of technological routenanodevices manufacturing, and specialized training software. Equipment includes a cross-functional scientific and productionunits, well designed for R&D in nanotechnology. Completeness of the technological line provides a full cycle productionof the selected semiconductor nanodevice. Supply of technical documentation for technological processes Innovativetraining process based on special training software. Long-term and timely technical and technological support. Equipment is oriented to R&D on substrates of Ø50.8 mm, with theenvisaged upgrading of equipment components with the ability to increasethe maximum diameter of the substrates up to 100 mm. Systems are unified of substrate holders type. Minimized maintenance costs for all equipment units. Systems technological reactors are kitted out with viewports for maximumprocess visualization. Graphical interface of process control is realized to simplify the processof specialists sequential training to perform various technologicaloperations.