Thin-film coatings equipment play a prominent role in semiconductor devices manufacturing especially in process of applying dopants and sealants to chips and other microelectronic parts. Physical Vapour Deposition (PVD) and Chemical Vapour Deposition (CVD) are two most common types of thin-film coating methods. Physical Vapour Deposition (PVD) is a variety of vacuum deposition methods used to deposit thin films by condensation of vaporized form of desired film material onto semiconductor wafers.

SemiTEq offers two types of PVD Systems:

• e-Beam Evaporation Systems
• Magnetron Sputtering Systems

Also SemiTEq can provide unique solutions based on Company's own scientific research and expierence for specific goals of our Customers.