language

STE MS900 Versatile Magnetron and Resistance Sputtering System

New versatile System for magnetron and thermo resistance sputtering for batch wafer processing

STE MS900 System allows to sputter multicomponent layers (metals, resistant layers etc.) on the substrate heated up to 500°C. System is designed for both active R&D and small­scale production. Maximum number of sputtering substrates in the same process: ∅150 mm – 6 pcs. Targets with diameter of 6’’ ensure uniformity of ±2% for ∅100 mm. Magnetic mount makes targets replacement very easy.

• water­cooled HV stainless steel reactor
• 5 ports for material sources with targets up to ∅6’’ (∅150 mm) and 1 port for ion source
• carousel type substrate holder with the possibility of varying the samples sizes
• 2 magnetron sources with target diameter up to  ∅150 mm and individual valves, 2 power sources (DC and RF) with automatic reconnection between the magnetrons in basic configuration and ability of setting optional magnetrons for Customers’ inquiry
• ion source (ions energy 20÷300 eV) for substrate cleaning  prior the deposition with the protective screens system
• 3 gas lines with automatic gas flow controllers including a corrosion­proof performance bypass line
• process gases: Ar, H2, O2, N2
• ability to install the witness­sample for resistance measuring
• substrate positioning relative to the specified sputtering source

• using as multifunctional System for vacuum deposition with different sources for R&D and small­scale production
• automated process control: ­
-thickness gauges indications, sample resistance measuring, etc. ­
-with automatic lock setting based on the energy resources (air, water, pure gases) 

Ultimate Pressure in process reactor, not less then

5х10-7 Torr

Time to achieve the process vacuum, no more then

20 min

Loading in one process

Ø150 mm - 6 pcs.

Carousel speed ​​range during the deposition process

0-60 rps/min

Wafer heating

Up to 500°С

Alternating bias on the sample, MHz

1

The pumping system performance:

- Turbomolecular pump, not less

- Dry scroll pump, not less

 

 

1300 l/s

35 m3/h