News 09.06.2007 XI International Economic Forum SemiTEq JSC took part in the XI International Economic Forum The company introduced a new development system of the molecular-beam epitaxy STE 3532. |
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- V Anniversary International Forum «Microelectronics 2019»
- 4th International Workshop on Ultraviolet Materials and Devices
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- XXIII Symposium «Nanophysics and Nanoelectronics»
- EuroMBE 2019 workshop
- Exhibition VacuumTechExpo 2018
- 19th European Workshop on Molecular Beam Epitaxy
- International Symposium «Nanophysics and Nanoelectronics”
- III-N 2017 Conference
- Merry Christmas and Happy New Year!
- SemiTEq released upgraded e-Beam evaporation system STE EB71
- SemiTEq released enhanced STE35 MBE system
- 18th European Molecular Beam Epitaxy workshop
- 5th CS International conference 2015
- India National Workshop on III-nitride Materials and Devices
- SemiTEq JSC has contracted for R&D MBE System supply for the University of Toronto
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- STE EB71: E-beam evaporation results
- Sub-μm Gate technology
- STE ICP: Plasma etching and PECVD
- MBE STE3526: MBE growth of laser heterostructures
- МВЕ STE3526: Hybrid heterostructures growth with III-V/II-VI heterovalent interface
- MBE STE3N: Characteristics of III-Nitrides growth
- Heterostructures based on GaAs
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