E-Beam evaporation systems E-Beam evaporation systems are intended to obtain thin films of metals (Ti, Al, Ni, Au, V, Mo, Zn, Cr, etc.), dielectrics and semiconductor materials in high and ultra-high vacuum. Special “mask” technology provides high uniformity of evaporated materials. At the same time, extensive technologies recipes library allows a quick start of pilot and serial production of semiconductor devices with required parameters. |
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