E-Beam evaporation systems

E-Beam evaporation systems are intended to obtain thin films of metals (Ti, Al, Ni, Au, V, Mo, Zn, Cr, etc.), dielectrics and semiconductor materials in high and ultra-high vacuum.

Special “mask” technology provides high uniformity of evaporated materials. At the same time, extensive technologies recipes library allows a quick start of pilot and serial production of semiconductor devices with required parameters.