STE EB65 e-Beam evaporation system for batch wafer processing STE EB65 system is intended for obtaining of metals, dielectrics and semiconductor materials thin films in high vacuum with batch wafer loading up to 3×Ø200mm in one process. STE EB65 System special feature is the evaporation chamber, which is separated by a vacuum gate valve for quick evacuation of the main volume and start of the process after wafer loading. E-Beam evaporator remains under HV conditions and ready for the next run
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