STE EB71 automated UHV e-Beam evaporation system

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STE EB71 Automated UHV e-Beam evaporation system

STE EB71 system is intended for e-beam evaporation of thin films in high and ultra-high vacuum. System design allows optimization of material consumption by adjustable evaporator-to-wafer distance. Special “mask” technology provides high uniformity of evaporated materials.

6×Ø2”
3×Ø3”
1×Ø100mm
1×Ø150mm
1×Ø200mm

EVAPORATION CHAMBER

Ultimate pressure <2⋅10^-9Torr

E-Beam evaporator

Up to 8×7сm³/4×15сm³ pocket volume of evaporated materials

Wafer heating

Adjustable evaporator-to-wafer distance 350÷500mm

Water-cooled quartz crystal thickness monitor

LOAD-LOCK CHAMBER

D-shape design

Ion beam source*

Resistive thermal evaporation source*

VACUUM SYSTEM

Pumping system configuration depends on STE EB71 system application (ion, turbomolecular pumps, scroll forepump)

PROCESS CONTROL

Process automatization

Programming and storage of technological recipes

* optional

High quality thin film deposition in ultra-high vacuum
Optimized materials cosumption by adjustable evaporation-to-wafer distance
Improved thickness uniformity due to the special "mask" technology