STE MS150 Versatile Magnetron Sputtering System

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STE MS150 Versatile R&D system for metal and dielectric thin films sputtering

Flexible configuration of STE MS150 system allows using of various sources as well it’s combining, and provides extensive capabilities for magnetron sputtering and resistive thermal evaporation of metals and dielectrics thin films.

1×Ø100mm
1×Ø150mm
3×Ø150mm when using carousel wafer holder

EVAPORATION CHAMBER

Up to 3 magnetron sources with targets of up to Ø150mm

Witness-sample*

Carousel wafer holder*

Ability to confocal sputtering due to using sources on a flexible bracket

Wafer holder rotation up to 20rpm

Wafer heating

Ion beam source*

Resistive thermal evaporator*

Water-cooled quartz crystal thickness monitor

LOAD-LOCK CHAMBER

Linear manipulator

Individual pumping system

VACUUM SYSTEM

Turbomolecular pump

Scroll forepump

PROCESS CONTROL

Process automatization

Programming and storage of technological recipes

* optional

Flexible configuration
Confocal sputtering due to using sources on a flexible bracket
Setting of magnetron source perpendicular to the plane of carousel rotation for batch wafer processing