SemiTEq — STE D700E E-Beam evaporation system


Molecular-Beam Epitaxy Systems (MBE) PVD Systems E-Beam evaporation systems Magnetron and resistive thermal evaporation systems Versatile PVD platform RTP & RTA Systems ICP/RIE/PECVD Systems Components and accessories	STE D700E E-Beam evaporation system STE D700E system based on the versatile PVD platform STE D700 and intended for e-beam evaporation of of metals, dielectrics and semiconductor materials thin films. System capacity: Basic configuration Key advantages: Standard configuration: 42×Ø2” 20×Ø3” 12×Ø100mm 6×Ø150mm Configuration with load-lock chamber:* 6×Ø2” 3×Ø3” 1×Ø100mm 1×Ø150mm 1×Ø200mm _______________________________________ optional EVAPORATION CHAMBER Up to 4×30сm3/6×15сm3 pocket volume of evaporated materials E-Beam digital scanning system for uniform target heating Ion beam cleaning D-shape design Water-cooling system Dome-shaped wafer holder Flat carousel wafer holder in configuration with load-lock chamber VACUUM SYSTEM Pumping system depends on a platform application (turbomolecular, cryogenic pumps, scroll forepump) PROCESS CONTROL Process automatization Programming and storage of technological recipes _____________________ optional Load-lock chamber Adjustable evaporator-to-wafer distance Wafer holder rotation up to 20rpm Wafer heating Ion beam source Protective screen system _____________________ *optional