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STE D700M Magnetron sputtering system

STE D700M system based on the versatile PVD platform STE D700 and intended for magnetron sputtering wide range of multilayer coatings

Standard configuration:

  • 42×Ø2”
  • 20×Ø3”
  • 12×Ø100mm
  • 6×Ø150mm

Configuration with load-lock chamber:*

  • 6×Ø2”
  • 3×Ø3”
  • 1×Ø100mm
  • 1×Ø150mm
  • 1×Ø200mm

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*optional


EVAPORATION CHAMBER

  • Sputtering system configuration depends on  end applications
  • Carousel or confocal version
  • Direct and indirect target cooling
  • Ion beam cleaning
  • D-shape design
  • Water-cooling system
  • Dome-shaped wafer holder
  • Flat carousel wafer holder in configuration with load-lock chamber*

VACUUM SYSTEM

  • Pumping system depends on a platform application (turbomolecular, cryogenic pumps, scroll forepump)

PROCESS CONTROL

  • Process automatization
  • Programming and storage of technological recipes

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*optional

  • Adjustable evaporator-to-wafer distance
  • Wafer holder rotation up to 20rpm
  • Wafer heating
  • Ion beam source
  • Protective screen system 

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*optional