SemiTEq — STE D700T Resistive thermal evaporation system


Molecular-Beam Epitaxy Systems (MBE) PVD Systems E-Beam evaporation systems Magnetron and resistive thermal evaporation systems Versatile PVD platform RTP & RTA Systems ICP/RIE/PECVD Systems Components and accessories	STE D700T Resistive thermal evaporation system STE D700T system based on the versatile PVD platform STE D700 and intended for resistive thermal evaporation of thin films on various wafers. System capacity: Basic configuration Key advantages: Standard configuration: 42×Ø2” 20×Ø3” 12×Ø100mm 6×Ø150mm Configuration with load-lock chamber:* 6×Ø2” 3×Ø3” 1×Ø100mm 1×Ø150mm 1×Ø200mm _______________________________________ optional EVAPORATION CHAMBER Evaporation system configuration depends on end applications Different types of resistive thermal evaporators Witness-sample with electrical resistance heating element D-shape design Water-cooling system Dome-shaped wafer holder Flat carousel wafer holder in configuration with load-lock chamber VACUUM SYSTEM Pumping system depends on a platform application (turbomolecular, cryogenic pumps, scroll forepump) PROCESS CONTROL Process automatization Programming and storage of technological recipes _____________________ optional Adjustable evaporator-to-wafer distance Wafer holder rotation up to 20rpm Wafer heating Ion beam source Protective screen system _____________________ optional