language

STE D700T Resistive thermal evaporation system

STE D700T system based on the versatile PVD platform STE D700 and intended for resistive thermal evaporation of thin films on various wafers.

Standard configuration:

  • 42×Ø2”
  • 20×Ø3”
  • 12×Ø100mm
  • 6×Ø150mm

Configuration with load-lock chamber:*

  • 6×Ø2”
  • 3×Ø3”
  • 1×Ø100mm
  • 1×Ø150mm
  • 1×Ø200mm

_______________________________________

*optional


EVAPORATION CHAMBER

  • Evaporation system configuration depends on end applications
  • Different types of resistive thermal evaporators
  • Witness-sample with electrical resistance heating element
  • D-shape design
  • Water-cooling system
  • Dome-shaped wafer holder
  • Flat carousel wafer holder in configuration with load-lock chamber*

VACUUM SYSTEM

  • Pumping system depends on a platform application (turbomolecular, cryogenic pumps, scroll forepump)

PROCESS CONTROL

  • Process automatization
  • Programming and storage of technological recipes

_____________________

*optional

  • Adjustable evaporator-to-wafer distance
  • Wafer holder rotation up to 20rpm
  • Wafer heating
  • Ion beam source
  • Protective screen system 

_____________________

*optional